Host application
Automatic, one-click creation of patterns
All symmetry types
Built-in library of popular repeats (layouts)
Interactive changes of the symmetry type, repeat size, drop amount, and other parameters
Interlocking design elements
One-click clipping of repeating units
Easily blended units
Supports raster (pixel-based) images
Supports vector (resolution-independent) elements
A pattern can include images with different resolutions
The pattern rebuilds automatically when you edit seed elements
Supports pixel-based selection
Arbitrarily scattered design elements
Freehand drawing directly into the pattern
Live editing of pattern swatches
Live editing of symbols and symbol sets
Live updates of pattern fills for all symmetry types
A pattern can contain a mix of different symmetries
Interactive editing of symbols inside patterns
Nested patterns (pattern in pattern)
Best for
Price for the download version
Price for the CD-ROM version with a printed user guide
